Atmospheric Flame Vapor Deposition of 1D and 2D Nanostructured Vanadium Pentoxide on Diverse Substrates

Vanadium pentoxide (V₂O₅) has attracted considerable interest owing to its unique chemical and physical properties. However, traditional synthesis methods are often time-consuming, complex, and difficult to scale, limiting the broader applications of V₂O₅. Herein, we present a flame vapor deposition (FVD) method to enable rapid, scalable, and one-step synthesis of various V₂O₅ nanostructures under ambient pressure conditions. By optimizing critical synthesis parameters, specifically, source temperature (840 °C) and substrate temperature (610 °C), we achieved highly crystalline, one-dimensional (1D) V₂O₅ nanorods on a variety of substrates, including silicon (Si), fluorine tin doped (FTO) glass, stainless steel, and silicon dioxide (SiO₂). Moreover, we demonstrate the rapid growth of ultrathin, two-dimensional (2D) V₂O₅ nanoflakes with nanometer-scale thickness, as well as enhanced uniformity and coverage density with an externally applied electric field. This FVD method provides a simple, efficient, and scalable approach for synthesizing advanced V₂O₅ nanostructures, significantly expanding opportunities for their integration into various technological applications.