Synthesis of dense SiC compacts by liquid Si infiltration and their dissolution characteristics in molten Si–Cr alloy
In the SiC solution growth method, a graphite crucible is generally used to hold the Si-based solution and serve as the C source. However, the excess C supply by crucible dissolution can easily generate SiC microcrystals in solution, resulting in the formation of macro-defects (SiC inclusions) in the grown crystals. To address this issue, liquid Si infiltration (LSI) was used to fabricate dense SiC compacts for the application as a source material in the SiC solution growth. Preforms for LSI process were prepared using SiC powder and various C sources (graphite, carbon black, and carbonized phenol resin), and fabrication of dense SiC compacts with SiC area fractions of ∼90 % was achieved. Apparent mass-transfer coefficients and J D factors were obtained from evaluating the dissolution behaviors of LSI-fabricated SiC compacts in a molten Si–Cr alloy under forced convection, and the dissolution characteristics were compared with graphite and sintered SiC. These results suggest that mass transfer at the boundary layer is the rate-limiting step of dissolution in this system. The J D factors of LSI–SiC were the smallest than those of graphite and sintered SiC, suggesting that LSI–SiC is a suitable source material for SiC solution growth.
Authors
- Takeshi Mitani (ORCID: https://orcid.org/0000-0002-4228-1707)
- Hiroyuki Shibata (ORCID: https://orcid.org/0000-0002-9965-7285)
- Didier Chaussende (ORCID: https://orcid.org/0000-0002-4180-8749)
- Sakiko Kawanishi (ORCID: https://orcid.org/0000-0002-3719-3788)
- Soh Ikarashi
- Takeshi Yoshikawa (ORCID: https://orcid.org/0000-0003-1991-0840)
Institutions
- Institut polytechnique de Grenoble (FR)
- Centre National de la Recherche Scientifique (FR)
- Tohoku University (JP)
- Kyoto University (JP)
- Science et Ingénierie des Matériaux et Procédés (FR)
- National Institute of Advanced Industrial Science and Technology (JP)
- Université Grenoble Alpes (FR)
- The University of Osaka (JP)
Publication Details
- Journal
- Ceramics International
- Published
- 2025-05-08
- DOI
- https://doi.org/10.1016/j.ceramint.2025.05.043
- Citations
- 1
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.73
Funders
- New Energy and Industrial Technology Development Organization
- New Energy and Industrial Technology Development Organization