Sensitivity analysis of the kinematic parameters during the industrial polishing process of ceramic floor tiles

This work is focused on the industrial polishing process of ceramic floor tiles. This study aims to evaluate how small deviations in three key operational parameters affect the glossiness of polished ceramic surfaces. These operating parameters are the most important kinematic variables that can be selected in industrial systems to control the movement of the grinding tools. Computational simulations were used to determine abrasive trajectories and quantify polishing uniformity. The simulated values enabled quantitative measurement of polishing quality sensitivity to kinematic deviations. These results are intended to support the daily tasks of operators and further research on process optimization.