Diffusivity of interstitial hydrogen in In2O3 from defect-pairing reaction kinetics
In2O3 is a transparent conducting oxide that finds widespread applications in transparent electrodes, flat-panel displays, and low-emissivity windows. Interstitial hydrogen (Hi+) in In2O3 gives rise to a shallow donor that is mobile at temperatures near 100 °C and that has an O–H vibrational line at 3304 cm−1 (77 K). In2O3 crystals grown by the flux method have been found to contain hydrogen with a concentration near 4 × 1017 cm−3 that is stably trapped in a form that is not readily seen by infrared spectroscopy. Hi+ can be dissociated from this trap by an anneal at an elevated temperature followed by a rapid quench, a treatment that produces the O–H line at 3304 cm−1. The released Hi+ then undergoes a diffusion-controlled reaction to become retrapped. Theory considers possibilities for the identity of the trapping center for Hi+ that has been investigated here and the activation barriers for Hi+ motion. The kinetics of this reversible trapping process reveals a diffusion constant for Hi+ that is in agreement with a recent prediction by Franckel et al.
Authors
- Andrew Venzie (ORCID: https://orcid.org/0009-0004-4688-1795)
- Michael Stavola (ORCID: https://orcid.org/0000-0002-2816-3763)
- L. A. Boatner (ORCID: https://orcid.org/0000-0002-0235-7594)
- W. Beall Fowler (ORCID: https://orcid.org/0000-0002-8570-9080)
- Juan Ramón Olalquiaga Pérez
Institutions
- Oak Ridge National Laboratory (US)
- Lehigh University (US)
Publication Details
- Journal
- Journal of Applied Physics
- Published
- 2025-05-08
- DOI
- https://doi.org/10.1063/5.0271156
- Primary Topic
- ZnO doping and properties
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Division of Materials Research
- Office of Advanced Cyberinfrastructure