Ultrapure Graphite from Solid Refining
Graphite has sparked extensive quantum physical discoveries and demonstrated numerous cutting-edge applications. However, existing graphite typically contains considerable impurities, and effective purification is still lacking. Here, a solid refining purification method is reported for obtaining ultrapure graphite. Through this design, impurities are filtered by the atomic lattice of a solid-state nickel (Ni). Suitable absorption, diffusion, and precipitation energy barriers are utilized in this method, allowing only carbon (C) atoms to effectively migrate through the Ni lattice to form high-quality graphite. The obtained ultrapure graphite shows the lowest elemental impurity density (<10 parts per million (ppm), which is one order of magnitude lower than that of the best available graphite), the highest structural purity (<0.2 parts per billion (ppb) of in-plane structural defect density and >99% Bernal stacking), and the highest doping purity (carrier doping density <2.0 × 10<sup>10</sup> cm<sup>-2</sup>). Such superior purity of graphite facilitates the all-integer visible Landau levels and the ultralow quantum transition magnetic field in the fabricated graphene device. This solid refinement technique should inspire the purification of various layered crystals, leading to the discovery of new phenomena and the development of advanced applications.
Authors
- Zhibin Zhang
- Mengze Zhao (ORCID: https://orcid.org/0009-0001-8240-6826)
- Ying Fu
- Ping‐Heng Tan (ORCID: https://orcid.org/0000-0001-6575-1516)
- Mingchao Ding (ORCID: https://orcid.org/0000-0002-8626-2444)
- Kaihui Liu (ORCID: https://orcid.org/0000-0002-8781-2495)
- Wei Yang (ORCID: https://orcid.org/0000-0002-3925-0352)
- Quanzhan Yang (ORCID: https://orcid.org/0000-0002-9920-1878)
- Xiaozhi Xu (ORCID: https://orcid.org/0000-0003-1067-9590)
- Muhong Wu (ORCID: https://orcid.org/0000-0003-3607-8945)
- Wenya Wei (ORCID: https://orcid.org/0009-0006-9097-7529)
- Ziqi Zhou (ORCID: https://orcid.org/0000-0002-2946-5069)
- Heng Wu (ORCID: https://orcid.org/0000-0002-2582-6322)
- Xuedong Bai (ORCID: https://orcid.org/0000-0002-1403-491X)
- Jingwei Dong (ORCID: https://orcid.org/0000-0002-5975-5155)
- Enge Wang (ORCID: https://orcid.org/0000-0001-5624-5320)
- Li Wang (ORCID: https://orcid.org/0000-0002-9615-1879)
- Guangyu Zhang (ORCID: https://orcid.org/0000-0003-1189-5324)
- Feng Ding (ORCID: https://orcid.org/0000-0001-9153-9279)
- Xue Chen (ORCID: https://orcid.org/0000-0002-8141-2431)
- Quanlin Guo
Institutions
- Liaoning University (CN)
- South China Normal University (CN)
- Chinese Academy of Sciences (CN)
- Peking University (CN)
- Songshan Lake Materials Laboratory (CN)
- Collaborative Innovation Center of Quantum Matter (CN)
- Institute of Semiconductors (CN)
- Institute of Physics (CN)
- University of Chinese Academy of Sciences (CN)
Publication Details
- Journal
- Advanced Materials
- Published
- 2025-05-06
- DOI
- https://doi.org/10.1002/adma.202500461
- Citations
- 3
- Primary Topic
- Graphene research and applications
- Type
- article
- Field-Weighted Citation Impact
- 1.55
Funders
- National Natural Science Foundation of China
- National Key Research and Development Program of China