Real‐Time Self‐Optimization of Quantum Dot Laser Emissions During Machine Learning‐Assisted Epitaxy

Traditional methods for optimizing light source emissions rely on a time-consuming trial-and-error approach. While in situ optimization of light source gain media emission during growth is ideal, it has yet to be realized. In this work, in situ reflection high-energy electron diffraction (RHEED) is integrated with machine learning (ML) to correlate the surface reconstruction with the photoluminescence (PL) of InAs/GaAs quantum dots (QDs), which serve as the active region of lasers. A lightweight ResNet-GLAM model is employed for the real-time processing of RHEED data as input, enabling effective identification of optical performance. This approach guides the dynamic optimization of growth parameters, allowing real-time feedback control to adjust the QDs emission for lasers. InAs QDs on GaAs substrates are successfully optimized, with a 3.2-fold increase in PL intensity and a reduction in full width at half maximum (FWHM) from 36.69 to 28.17 meV. Automated, in situ self-optimized lasers with 5-layer InAs QDs achieved electrically pumped continuous-wave operation at 1240 nm with a low threshold current of 150 A cm<sup>-</sup> <sup>2</sup> at room temperature, an excellent performance comparable to samples grown through traditional manual multi-parameter optimization methods. These results mark a significant step toward intelligent, low-cost, and reproductive light emitters production.

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Publication Details

Journal
Advanced Science
Published
2025-05-02
DOI
https://doi.org/10.1002/advs.202503059
Citations
5
Primary Topic
Integrated Circuits and Semiconductor Failure Analysis
Type
article
Field-Weighted Citation Impact
3.65

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article

Real‐Time Self‐Optimization of Quantum Dot Laser Emissions During Machine Learning‐Assisted Epitaxy

Chao Shen, Chi Xu, Siming Chen, Zhanguo Wang et al.
5 citations
Advanced Science
Integrated Circuits and Semiconductor Failure Analysis
3.65
article

Real‐Time Self‐Optimization of Quantum Dot Laser Emissions During Machine Learning‐Assisted Epitaxy

Chao Shen, Chi Xu, Siming Chen, Zhanguo Wang, Tien Khee Ng, Wenkang Zhan, Chao Zhao, Bo-Wei Xu, Hui Cong, Xue Chun-Lai, Hongyue Hao, Shujie Pan, Ning Zhuo, Kaiyao Xin
article en
5 citations

Abstract

Traditional methods for optimizing light source emissions rely on a time-consuming trial-and-error approach. While in situ optimization of light source gain media emission during growth is ideal, it has yet to be realized. In this work, in situ reflection high-energy electron diffraction (RHEED) is integrated with machine learning (ML) to correlate the surface reconstruction with the photoluminescence (PL) of InAs/GaAs quantum dots (QDs), which serve as the active region of lasers. A lightweight ResNet-GLAM model is employed for the real-time processing of RHEED data as input, enabling effective identification of optical performance. This approach guides the dynamic optimization of growth parameters, allowing real-time feedback control to adjust the QDs emission for lasers. InAs QDs on GaAs substrates are successfully optimized, with a 3.2-fold increase in PL intensity and a reduction in full width at half maximum (FWHM) from 36.69 to 28.17 meV. Automated, in situ self-optimized lasers with 5-layer InAs QDs achieved electrically pumped continuous-wave operation at 1240 nm with a low threshold current of 150 A cm<sup>-</sup> <sup>2</sup> at room temperature, an excellent performance comparable to samples grown through traditional manual multi-parameter optimization methods. These results mark a significant step toward intelligent, low-cost, and reproductive light emitters production.

Advanced ScienceVol. 12(27)
Chinese Academy of Sciences (CN), Institute of Semiconductors (CN), University of Chinese Academy of Sciences (CN), King Abdullah University of Science and Technology (SA)
National Natural Science Foundation of China, Natural Science Foundation of Beijing Municipality, National Key Research and Development Program of China
Affordable and clean energy
Openalex Percentile: Top 7%
Integrated Circuits and Semiconductor Failure Analysis
3.65
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