MBE growth and characterization of strained GeSn/Ge multiple quantum well structures

Abstract Germanium tin (GeSn) alloys have emerged as pivotal materials for advanced optoelectronic applications owing to their tunable bandgaps and compatibility with silicon-based technologies. In this study, high quality GeSn multiple quantum wells (MQWs) with Sn concentrations of 7.0 ± 0.5% and 7.7 ± 0.5% were successfully grown on Ge(001) substrates using molecular beam epitaxy (MBE). The pseudomorphic growth of the MQWs and the high crystalline quality is evidenced by high-resolution x-ray diffraction. Cross-sectional transmission electron microscopy confirms a low defect density at the interfaces between GeSn wells and Ge barriers. Atomic probe topography shows the consumption of Sn atoms in the Ge barrier layer, preventing Sn segregation through the MQW structure. Atomic force microscopy reveals a smooth surface free of Sn droplets. Photoluminescence spectroscopy demonstrates optical emission at different wavelengths for varying Sn composition and QW thickness, confirming quantum confinement effects. These findings highlight the potential of MBE to produce high-quality GeSn/Ge MQWs with minimal defects, offering significant contribution for the next generation of optoelectronic devices.

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Publication Details

Journal
Journal of Physics D Applied Physics
Published
2025-05-01
DOI
https://doi.org/10.1088/1361-6463/add273
Citations
4
Primary Topic
Photonic and Optical Devices
Type
article
Field-Weighted Citation Impact
2.92

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article

MBE growth and characterization of strained GeSn/Ge multiple quantum well structures

Yuriy I. Mazur, Serhii Kryvyi, Dinesh Baral, Mohammad Zamani‐Alavijeh et al.
4 citations
Journal of Physics D Applied Physics
Photonic and Optical Devices
2.92
article

MBE growth and characterization of strained GeSn/Ge multiple quantum well structures

Yuriy I. Mazur, Serhii Kryvyi, Dinesh Baral, Mohammad Zamani‐Alavijeh, Nirosh M. Eldose, Ilias Bikmukhametov, Jifeng Liu, Hryhorii V. Stanchu, Shui-Qing Yu, Wei Du, Diandian Zhang, Gregory J. Salamo, Mourad Benamara, Fernando M. de Oliveira, Yi‐Cheng Wang, Shang Liu
article en
4 citations

Abstract

Abstract Germanium tin (GeSn) alloys have emerged as pivotal materials for advanced optoelectronic applications owing to their tunable bandgaps and compatibility with silicon-based technologies. In this study, high quality GeSn multiple quantum wells (MQWs) with Sn concentrations of 7.0 ± 0.5% and 7.7 ± 0.5% were successfully grown on Ge(001) substrates using molecular beam epitaxy (MBE). The pseudomorphic growth of the MQWs and the high crystalline quality is evidenced by high-resolution x-ray diffraction. Cross-sectional transmission electron microscopy confirms a low defect density at the interfaces between GeSn wells and Ge barriers. Atomic probe topography shows the consumption of Sn atoms in the Ge barrier layer, preventing Sn segregation through the MQW structure. Atomic force microscopy reveals a smooth surface free of Sn droplets. Photoluminescence spectroscopy demonstrates optical emission at different wavelengths for varying Sn composition and QW thickness, confirming quantum confinement effects. These findings highlight the potential of MBE to produce high-quality GeSn/Ge MQWs with minimal defects, offering significant contribution for the next generation of optoelectronic devices.

Journal of Physics D Applied PhysicsVol. 58(22)
Dartmouth College (US), University of Alabama (US), Dartmouth Hospital (GB), University of Arkansas at Fayetteville (US)
Air Force Office of Scientific Research
Openalex Percentile: Top 9%
Photonic and Optical Devices
2.92
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