Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges

This paper investigates the influence of collision processes within the sheath on ion energy distribution functions (IEDFs) in a low-pressure dual-frequency capacitively coupled plasma (DF-CCP). Through the use of a 1D3V particle-in-cell/Monte Carlo collision model, the roles of ionization and charge-exchange collisions in the formation of an additional low-energy peak in the IEDF are explored. The simulations indicate that the additional energy peak primarily arises from ionization collisions that occur within a single cycle, while charge-exchange collisions contribute increasingly over multiple cycles. These findings highlight the complex dynamics of ion energy distributions in DF-CCPs, providing valuable insights for optimizing plasma processing in microelectronics.

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Publication Details

Journal
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Published
2025-05-01
DOI
https://doi.org/10.1116/6.0004221
Primary Topic
Plasma Diagnostics and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges

Nosir Matyakubov, Ziheng Liu, Quan‐Zhi Zhang, Fang‐Fang Ma et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Plasma Diagnostics and Applications
article

Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges

Nosir Matyakubov, Ziheng Liu, Quan‐Zhi Zhang, Fang‐Fang Ma, Yu-Meng Cui, Eugenia Krutsilina
article en

Abstract

This paper investigates the influence of collision processes within the sheath on ion energy distribution functions (IEDFs) in a low-pressure dual-frequency capacitively coupled plasma (DF-CCP). Through the use of a 1D3V particle-in-cell/Monte Carlo collision model, the roles of ionization and charge-exchange collisions in the formation of an additional low-energy peak in the IEDF are explored. The simulations indicate that the additional energy peak primarily arises from ionization collisions that occur within a single cycle, while charge-exchange collisions contribute increasingly over multiple cycles. These findings highlight the complex dynamics of ion energy distributions in DF-CCPs, providing valuable insights for optimizing plasma processing in microelectronics.

Journal of Vacuum Science & Technology A Vacuum Surfaces and FilmsVol. 43(3)
Urgench State University (UZ), Dalian University of Technology (CN), New Uzbekistan University (UZ), National University of Uzbekistan (UZ)
National Natural Science Foundation of China, National Key Research and Development Program of China
Openalex Percentile: Top 93%
Plasma Diagnostics and Applications
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