Long-Term High-Temperature Dynamic Gate Stress Reliability of a Last-Generation, Automotive-Grade, Planar 1200 V SiC MOSFET

In this work, the dynamic gate stress (DGS) on a planar-gate silicon carbide MOSFET is performed based on an automotive mission profile. An extensive characterization was performed, even beyond automotive qualification guidelines, including the effect of the temperature. The results show that the temperature accelerates the threshold voltage drift, which ranges from 3 % at room temperature up to 6 % at 125 °C and 150°C, with negligible impact on the on-state resistance. Moreover, we measured the gate-source voltage waveforms before and after the DGS stress, not finding significant variations in switching gradients.

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Publication Details

Published
2025-03-16
DOI
https://doi.org/10.1109/apec48143.2025.10977549
Citations
2
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
1.46
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article

Long-Term High-Temperature Dynamic Gate Stress Reliability of a Last-Generation, Automotive-Grade, Planar 1200 V SiC MOSFET

Francesco Iannuzzo, Alessandro Sitta, Michele Calabretta, M. Fiore et al.
2 citations
Silicon Carbide Semiconductor Technologies
1.46
article

Long-Term High-Temperature Dynamic Gate Stress Reliability of a Last-Generation, Automotive-Grade, Planar 1200 V SiC MOSFET

Francesco Iannuzzo, Alessandro Sitta, Michele Calabretta, M. Fiore, Giuseppe Mauromicale
article en
2 citations

Abstract

In this work, the dynamic gate stress (DGS) on a planar-gate silicon carbide MOSFET is performed based on an automotive mission profile. An extensive characterization was performed, even beyond automotive qualification guidelines, including the effect of the temperature. The results show that the temperature accelerates the threshold voltage drift, which ranges from 3 % at room temperature up to 6 % at 125 °C and 150°C, with negligible impact on the on-state resistance. Moreover, we measured the gate-source voltage waveforms before and after the DGS stress, not finding significant variations in switching gradients.

STMicroelectronics (Italy) (IT), Aalborg University (DK)
Affordable and clean energy
Openalex Percentile: Top 18%
Silicon Carbide Semiconductor Technologies
1.46
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Long-Term High-Temperature Dynamic Gate Stress Reliability of a Last-Generation, Automotive-Grade, Planar 1200 V SiC MOSFET — Francesco Iannuzzo, Alessandro Sitta, et al. · (2025) | TGRS Research Map | TGRS