Bit Line Hammering in Si-Based VCT DRAM: A New Security Challenge and Its Mitigation
We introduce the Bit Line Hammer (BL hammer) effect, a serious disturbance mechanism in 4F2 DRAM with Si-based Vertical Channel Transistors (VCT). We demonstrate that a specifically designed BL attack pattern, featuring asymmetry and an appropriate toggling frequency, can trigger numerous bit-flips under JEDEC standards, especially at elevated temperatures. This uncovers an unexplored security vulnerability in VCT DRAM cells, with implications for data integrity in advanced memory technologies. Finally, we propose a mitigation strategy to improve cell’s resistance to the BL hammering.
Authors
- Runsheng Wang (ORCID: https://orcid.org/0000-0002-7514-0767)
- Pengpeng Ren (ORCID: https://orcid.org/0009-0001-2986-9231)
- Zhigang Ji (ORCID: https://orcid.org/0000-0003-1138-804X)
- Yong Liu (ORCID: https://orcid.org/0000-0003-2165-062X)
- Da Wang (ORCID: https://orcid.org/0000-0002-0365-5673)
- Ru Huang
Institutions
- Shanghai Jiao Tong University (CN)
- Peking University (CN)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2025-03-05
- DOI
- https://doi.org/10.1109/led.2025.3548560
- Citations
- 2
- Primary Topic
- Integrated Circuits and Semiconductor Failure Analysis
- Type
- article
- Field-Weighted Citation Impact
- 1.46
Funders
- National Natural Science Foundation of China