Electroless Plating of Barrier Metal for TSV of 3-D Integration and Cu direct ECP Filling on It

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Publication Details

Journal
Journal of The Surface Finishing Society of Japan
Published
2024-11-01
DOI
https://doi.org/10.4139/sfj.75.478
Primary Topic
3D IC and TSV technologies
Type
article
Field-Weighted Citation Impact
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Electroless Plating of Barrier Metal for TSV of 3-D Integration and Cu direct ECP Filling on It

Shoso Shingubara
4 links
Journal of The Surface Finishing Society of Japan
3D IC and TSV technologies
article

Electroless Plating of Barrier Metal for TSV of 3-D Integration and Cu direct ECP Filling on It

Shoso Shingubara
article en

Abstract

No abstract available for this paper.
Journal of The Surface Finishing Society of JapanVol. 75(11)
Kansai University (JP)
Openalex Percentile: Top 72%
3D IC and TSV technologies
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Electroless Plating of Barrier Metal for TSV of 3-D Integration and Cu direct ECP Filling on It — Shoso Shingubara · Journal of The Surface Finishing Society of Japan (2024) | TGRS Research Map | TGRS