Residual Stresses at the Film—Substrate Interface

The relevance of thin films (less than 1000 nm) for the industries of optics, photonics and microelectronics is presented. Examples of defects that arise in the presence of stress in films are given. Methods for minimizing the stress state at the film—substrate interface are shown. Methods for measuring the stressed state of films are described.

Authors

Svetlana V. Sidorova (ORCID: https://orcid.org/0000-0002-3002-1246)
Aleksey D. Kouptsov

Publication Details

Journal: Nano- i Mikrosistemnaya Tehnika
Published: 2025-02-19
DOI: https://doi.org/10.17587/nmst.27.15-24
Primary Topic: Metal and Thin Film Mechanics
Type: article
Field-Weighted Citation Impact: 0.00

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article

Residual Stresses at the Film—Substrate Interface

Svetlana V. Sidorova, Aleksey D. Kouptsov

Feb 19, 2025

Nano- i Mikrosistemnaya Tehnika

Metal and Thin Film Mechanics

article

Residual Stresses at the Film—Substrate Interface

Svetlana V. Sidorova, Aleksey D. Kouptsov

February 19, 2025article en

Abstract

Nano- i Mikrosistemnaya TehnikaVol. 27(1)

Openalex Percentile: Top 90%

Metal and Thin Film Mechanics

DOI Source OpenAlex

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Residual Stresses at the Film—Substrate Interface — Svetlana V. Sidorova, Aleksey D. Kouptsov · Nano- i Mikrosistemnaya Tehnika (2025) | TGRS Research Map | TGRS