Nonvolatile Applications and Reliability Investigation of La-Doped ZrO2 Antiferroelectric Capacitors
The nonvolatile application of La-doped ZrO2 (ZLO) antiferroelectric capacitors is demonstrated in this study, accompanied by systematic investigation of device reliability. A built-in electric field was successfully established through engineered work function modulation. The fabricated nonvolatile (NV) ZLO capacitor exhibits not only avoidance of wake-up and fatigue phenomena typically observed in ferroelectric systems but also demonstration of ultralow coercive voltage (2Vc = 1.2 V) and exceptional endurance exceeding 1012 cycles. The inherent unique polarization reversal mechanism in NV ZLO device was identified as the origin of a unidirectional imprint effect. Accelerated testing at 85 °C for 104 s yielded conclusive evidence of retention characteristic stability. This investigation provides a novel perspective for the engineering utilization of antiferroelectric materials and facilitates their potential incorporation into advanced integrated circuit architectures.
Authors
- Zeping Weng
- Choonghyun Lee (ORCID: https://orcid.org/0000-0001-9696-2308)
- Wenchao Yan (ORCID: https://orcid.org/0000-0001-6592-6080)
- Junliang Zhou
- Zibo Dong
- Jianguo Li (ORCID: https://orcid.org/0000-0001-7360-8787)
- Yi Zhao
- Yuetong Huo (ORCID: https://orcid.org/0009-0009-3322-4741)
Institutions
- East China Normal University (CN)
- Zhejiang University (CN)
Publication Details
- Journal
- Electronics
- Published
- 2025-04-28
- DOI
- https://doi.org/10.3390/electronics14091794
- Primary Topic
- Ferroelectric and Negative Capacitance Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China
- National Key Research and Development Program of China