Development of leadless packaged heavily doped N-type 4H-SiC pressure sensor family for harsh environments

In many industries, there is a growing demand for semiconductor pressure sensors capable of operating in harsh environments with extremely high and low temperatures and high vibrations. Utilizing the piezoresistive effect of heavily doped N-type 4H-SiC, we proposed a family design of eight pressure sensor chip structures featuring different diaphragm shapes of circles and squares, along with different piezoresistor configurations. The 4H-SiC piezoresistive pressure sensor was developed using micro-electromechanical systems (MEMS) technology and encapsulated in a leadless package structure via low-stress connection achieved by glass frit sintering. The 4H-SiC pressure sensor demonstrates impressive performance, exhibiting an accuracy of 0.18% FSO and a temperature tolerance range from -50 to 600 °C, with a temperature coefficient of zero output as low as 0.08%/°C at 600 °C. Furthermore, the developed sensor shows remarkable stability under conditions of high-temperature vibration coupling. The advancement of this family of 4H-SiC pressure sensors provides a promising solution for pressure measurement in harsh industrial environments.

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Publication Details

Journal
Microsystems & Nanoengineering
Published
2025-04-28
DOI
https://doi.org/10.1038/s41378-025-00929-z
Citations
1
Primary Topic
Advanced MEMS and NEMS Technologies
Type
article
Field-Weighted Citation Impact
0.73

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Development of leadless packaged heavily doped N-type 4H-SiC pressure sensor family for harsh environments

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article

Development of leadless packaged heavily doped N-type 4H-SiC pressure sensor family for harsh environments

Lukang Wang, Yabing Wang, Minye Yang, Neng Wan, Jianfeng Zhu, Yulong Zhao, You Zhao, Ming Liu, Yi Lyu, Yu Yang
article en
1 citations

Abstract

In many industries, there is a growing demand for semiconductor pressure sensors capable of operating in harsh environments with extremely high and low temperatures and high vibrations. Utilizing the piezoresistive effect of heavily doped N-type 4H-SiC, we proposed a family design of eight pressure sensor chip structures featuring different diaphragm shapes of circles and squares, along with different piezoresistor configurations. The 4H-SiC piezoresistive pressure sensor was developed using micro-electromechanical systems (MEMS) technology and encapsulated in a leadless package structure via low-stress connection achieved by glass frit sintering. The 4H-SiC pressure sensor demonstrates impressive performance, exhibiting an accuracy of 0.18% FSO and a temperature tolerance range from -50 to 600 °C, with a temperature coefficient of zero output as low as 0.08%/°C at 600 °C. Furthermore, the developed sensor shows remarkable stability under conditions of high-temperature vibration coupling. The advancement of this family of 4H-SiC pressure sensors provides a promising solution for pressure measurement in harsh industrial environments.

Microsystems & NanoengineeringVol. 11(1)
Ministry of Education of the People's Republic of China (CN), Xi'an Technological University (CN), First Affiliated Hospital of Xi'an Jiaotong University (CN), Ministry of Education (TW), Ministry of Education (BD), Shenzhen Academy of Aerospace Technology (CN), Xi'an Jiaotong University (CN)
National Natural Science Foundation of China, China Postdoctoral Science Foundation
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Openalex Percentile: Top 29%
Advanced MEMS and NEMS Technologies
0.73
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