Backside patterning process enablement and its challenges for driving Moore's Law

With Initial Intel report on Back Side Power Delivery using PowerVia in 2023 and its commitment for deployment in Intel products in 2025 has driving rapid expansion of R&D to enable deployment across the semiconductor Industry. This Intel innovation helps in delivering tighter Cell Height (CH) with simpler process, cost and better interconnect performance. In this talk, we will discuss the process challenges , patterning and process enablement needed for driving advancement of these feature in GAA architecture scaling.

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Publication Details

Published
2025-04-25
DOI
https://doi.org/10.1117/12.3054365
Primary Topic
Metal Forming Simulation Techniques
Type
article
Field-Weighted Citation Impact
0.00
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article

Backside patterning process enablement and its challenges for driving Moore's Law

Mark C. Phillips, Nikhil Mehta
Metal Forming Simulation Techniques
article

Backside patterning process enablement and its challenges for driving Moore's Law

Mark C. Phillips, Nikhil Mehta
article en

Abstract

With Initial Intel report on Back Side Power Delivery using PowerVia in 2023 and its commitment for deployment in Intel products in 2025 has driving rapid expansion of R&D to enable deployment across the semiconductor Industry. This Intel innovation helps in delivering tighter Cell Height (CH) with simpler process, cost and better interconnect performance. In this talk, we will discuss the process challenges , patterning and process enablement needed for driving advancement of these feature in GAA architecture scaling.

Intel (United States) (US)
Peace, Justice and strong institutions
Openalex Percentile: Top 92%
Metal Forming Simulation Techniques
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