Ellipsometric Surface Oxidation Model of ALD-Grown Vanadium Oxide Mixed-Valence System

Vanadium and oxygen form a complex system of vanadium oxides with multiple phases and mixed valency, increasing the difficulty of characterization. In this work, amorphous vanadium oxide thin films with mixed valence states were fabricated by atomic layer deposition, and then post-annealing was conducted for crystalline films. For the surface analysis of this mixed-valence system, X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) were employed. However, XPS is only able to quasi-quantitatively determine the surface-proximity oxidation states. To account for the inadequacy of surface-sensitive XPS and AES techniques, a surface oxidation model (SOM) was proposed for the ellipsometric modeling of the mixed-valence system. Furthermore, by conducting air thermal oxidation (ATO) experiments, the four sets of fitting parameters of SOM were decreased to three, lowering the system complexity. This study is expected to help with the analysis of vanadium oxide mixed-valence systems and other multivalent metal oxide systems.