Experimental determination of giant polarization in wurtzite III-nitride semiconductors

Polarization engineering has revolutionized the photonic and electronic landscape of III-nitride semiconductors over the past decades. However, recent revelations of giant ferroelectric polarization in wurtzite III-nitrides challenge the long-standing paradigms. Here, we experimentally elucidate the polarization, including its magnitude and orientation, and its relationship to lattice polarity in III-nitrides. Those experimentally determined polarizations exceeding 1 C/m<sup>2</sup> with an upward orientation in metal-polar wurtzite nitride compounds align with recent theoretical predictions. To reconcile these findings, a unified polarization framework is established based on the centrosymmetric layered-hexagonal reference structure. This unified framework redefines the polarization landscape in contemporary GaN heterostructures, quantum structures, and ferroelectric heterostructures. Furthermore, we predict significant tunability and a dramatic increase in sheet carrier concentration in ferroelectric ScAlN/GaN heterostructures, heralding advancements in high-power, high-frequency, and reconfigurable transistors, and non-volatile memories. This work bridges the critical gap in the understanding of polarization in both conventional and ferroelectric wurtzite nitrides, offering fundamental insights and paving the way for next-generation photonic, electronic, and acoustic devices.

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Publication Details

Journal
Nature Communications
Published
2025-04-24
DOI
https://doi.org/10.1038/s41467-025-58975-0
Citations
17
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
21.39

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article

Experimental determination of giant polarization in wurtzite III-nitride semiconductors

Haotian Ye, Bowen Sheng, Xinqiang Wang, Wenjie Ma et al.
17 citations
Nature Communications
GaN-based semiconductor devices and materials
21.39
article

Experimental determination of giant polarization in wurtzite III-nitride semiconductors

Haotian Ye, Bowen Sheng, Xinqiang Wang, Wenjie Ma, Wen‐Yi Tong, Chun‐Gang Duan, Ping Wang, Rui Wang, Fang Liu, Tao Wang, Hongjian Li, Zhaoying Chen, Bo Shen, Weikun Ge, Bo An, Xifan Xu, Jinlin Wang, Ran Feng
article en
17 citations

Abstract

Polarization engineering has revolutionized the photonic and electronic landscape of III-nitride semiconductors over the past decades. However, recent revelations of giant ferroelectric polarization in wurtzite III-nitrides challenge the long-standing paradigms. Here, we experimentally elucidate the polarization, including its magnitude and orientation, and its relationship to lattice polarity in III-nitrides. Those experimentally determined polarizations exceeding 1 C/m<sup>2</sup> with an upward orientation in metal-polar wurtzite nitride compounds align with recent theoretical predictions. To reconcile these findings, a unified polarization framework is established based on the centrosymmetric layered-hexagonal reference structure. This unified framework redefines the polarization landscape in contemporary GaN heterostructures, quantum structures, and ferroelectric heterostructures. Furthermore, we predict significant tunability and a dramatic increase in sheet carrier concentration in ferroelectric ScAlN/GaN heterostructures, heralding advancements in high-power, high-frequency, and reconfigurable transistors, and non-volatile memories. This work bridges the critical gap in the understanding of polarization in both conventional and ferroelectric wurtzite nitrides, offering fundamental insights and paving the way for next-generation photonic, electronic, and acoustic devices.

Nature CommunicationsVol. 16(1)
King University (US), Peking University (CN), Collaborative Innovation Center of Quantum Matter (CN), East China Normal University (CN)
National Natural Science Foundation of China, China Postdoctoral Science Foundation, Peking University, National Key Research and Development Program of China
Openalex Percentile: Top 0%
GaN-based semiconductor devices and materials
21.39
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