Effect of thermal process for biomass EUV/EB resist

We proposed biomass resist for EUV and EB applications. In this study, the effect of thermal history on the biomass resist was evaluated. Theoretically, main chain scission resist can skip post-exposure bake (PEB) to form patterns. However, we observed differences in the quality and sensitivity of resist patterns with various PEB temperatures. These results suggest the potential for improving the performance of biomass resist through process optimization.