Using a FEM-based Maxwell solver and CD-RSoXS measurement for the analysis of photoresist pattern

Understanding the interfacial structure and morphology of nanostructures is crucial for advancing photolithography. In this study, we combine a Finite Element Method (FEM)-based Maxwell solver with Resonant Soft X-ray Scattering (RSoXS) measurements to analyze the structural variations in nanograting. The FEM-based Maxwell solver is employed to simulate the scattering intensities and electromagnetic field distributions, providing detailed insight into the interaction of soft x-rays with complex patterns. Concurrently, RSoXS measurements offer a high-resolution experimental technique to probe the material composition and structure at the nanoscale. By integrating simulation and experimental data, we achieve a comprehensive understanding of the dynamics and structural changes in nanostructures, paving the way for the optimization of patterning techniques. This approach demonstrates a powerful methodology for the analysis of nanostructured materials, enhancing our ability to design and control advanced materials for next-generation lithographic applications.