Advanced coater/developer technologies towards high-NA EUV production volume manufacturing

In this paper, I present improved EUV patterning performance by optimizing CAR and MOR coater/developer processes (and their respective etch transfers) to meet the challenges of high NA EUV mass production. We will discuss the challenges and solutions associated with extending CAR for a first-generation high NA EUV process, as well as proposed mass-production ready solutions for MOR

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Published
2025-04-22
DOI
https://doi.org/10.1117/12.3051184
Primary Topic
Electron and X-Ray Spectroscopy Techniques
Type
article
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article

Advanced coater/developer technologies towards high-NA EUV production volume manufacturing

Tetsunari Furusho
Electron and X-Ray Spectroscopy Techniques
article

Advanced coater/developer technologies towards high-NA EUV production volume manufacturing

Tetsunari Furusho
article en

Abstract

In this paper, I present improved EUV patterning performance by optimizing CAR and MOR coater/developer processes (and their respective etch transfers) to meet the challenges of high NA EUV mass production. We will discuss the challenges and solutions associated with extending CAR for a first-generation high NA EUV process, as well as proposed mass-production ready solutions for MOR

Tokyo Electron (Japan) (JP)
Industry, innovation and infrastructure
Openalex Percentile: Top 92%
Electron and X-Ray Spectroscopy Techniques
DOISourceOpenAlex
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Advanced coater/developer technologies towards high-NA EUV production volume manufacturing — Tetsunari Furusho · (2025) | TGRS Research Map | TGRS