PFAS substitution in photolithography materials: strategies and progress

As PFAS regulation has become more stringent, DuPont is empowering our customers to begin substituting PFAS in the photolithography process. Utilizing computational chemistry and synthetic organic chemistry, DuPont has established a versatile “library” of non-fluorine PAGs, which are capable of providing comparable lithographic performance to the PFAS counterparts in both KrF and ArF. DuPont is committed to innovations that are Safe and Sustainable, but we recognize that the process of PFAS substitution is a long journey that requires investment, collaboration and customer investment in testing and qualification of new non-PFAS alternatives. DuPont will continue to work with consortia to build essential use understanding for the use of these materials in the semiconductor industry to support derogations for the essential use of PFAS where alternatives do not exist. In this presentation, we will give an overview of DuPont’s strategy and progress toward the study and development of PFAS alternatives.