Commercialization of non-PFAS KrF and development of non-PFAS EUV photoresists
Aligned with our safe and sustainable by design culture, DuPont has initiated a comprehensive program focused on exploring non-PFAS/non-fluorinated alternatives in photoresist and lithographic patterning materials. A library of novel non-fluorine Photoacid Generators (PAG) have been developed and applied into KrF and EUV photoresists for various applications. This paper will summarize our efforts to investigate the relationship between the properties of non-fluorine PAGs and the lithographic performance parameters, such as Process Window (PW), Iso-focal Region (IFR), Iso-Dense Bias (IDB), and pattern profiles. This lithographic performance parameter data will help to provide the fundamental understanding needed for the development of commercially viable non-fluorine KrF photoresist alternatives.
Authors
- Mitsuru Haga
- Gregory Prokopowicz (ORCID: https://orcid.org/0000-0003-3643-2422)
- Edon Vitaku (ORCID: https://orcid.org/0000-0002-0057-4245)
- Hua Dong (ORCID: https://orcid.org/0000-0003-0603-6015)
- Kyuhwan Kim
- Juhyeon Park
- Sabrina Wong
- Gumhye Jeon
- Karen Petrillo
- Paul LaBeaume
- Yinjie Cen (ORCID: https://orcid.org/0000-0003-4540-5880)
- Qiuzhe Xie
- Wanyi Huang
- June‐Key Chung (ORCID: https://orcid.org/0000-0002-6866-8571)
- Jungkyun Oh
- Sungan Do
- Jayoung Koo
- Cong Liu (ORCID: https://orcid.org/0000-0002-9671-8054)
- Jong Park (ORCID: https://orcid.org/0000-0003-3353-3543)
- Huan He
- Hoyoon Park
- Hye Won Lee
- Song‐Se Yi
- Jae Hwan Sim
- Mark Hayes
- Joeseph Lachowski
Institutions
- DuPont (United States) (US)
- Samsung (South Korea) (KR)
- IBM Research - Thomas J. Watson Research Center (US)
Publication Details
- Published
- 2025-04-22
- DOI
- https://doi.org/10.1117/12.3050881
- Citations
- 1
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.73