Mechanistic studies of positive-tone organoantimony resists

We conducted a series of mechanistic studies to elucidate how several antimony carboxylate complexes (R<sub>3</sub>Sb(O<sub>2</sub>CR')<sub>2</sub>) produce positive-tone imaging when irradiated with EUV light or electron-beams. An ablation study demonstrated that compounds containing the styrene carboxylate ligand (-O<sub>2</sub>CC<sub>6</sub>H<sub>4</sub>CH=CH<sub>2</sub>) do not ablate while compounds without this ligand do ablate. Volatile photoproducts were identified using mass spectroscopy when irradiated with either EUV light or electron beams. These photoproducts include carbon dioxide and fragments of some of the R and R’ groups. A mechanism is proposed in which the styrene carboxylate ligand plays a pivotal role, by first polymerizing (thermally or as a result of low levels of flare) then decomposing to produce carboxylates or metal fragments that are soluble in aqueous base developer.

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Published
2025-04-22
DOI
https://doi.org/10.1117/12.3051499
Citations
1
Primary Topic
Advancements in Photolithography Techniques
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article
Field-Weighted Citation Impact
0.73
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article

Mechanistic studies of positive-tone organoantimony resists

Robert L. Brainard, Sean C. Smith, Shaheen Hasan, Ricardo Burke et al.
1 citations
Advancements in Photolithography Techniques
0.73
article

Mechanistic studies of positive-tone organoantimony resists

Robert L. Brainard, Sean C. Smith, Shaheen Hasan, Ricardo Burke, Munsaf Ali, Nitinkumar S. Uphadyay, Jordan Greenough, Greg Denbeaux
article en
1 citations

Abstract

We conducted a series of mechanistic studies to elucidate how several antimony carboxylate complexes (R<sub>3</sub>Sb(O<sub>2</sub>CR')<sub>2</sub>) produce positive-tone imaging when irradiated with EUV light or electron-beams. An ablation study demonstrated that compounds containing the styrene carboxylate ligand (-O<sub>2</sub>CC<sub>6</sub>H<sub>4</sub>CH=CH<sub>2</sub>) do not ablate while compounds without this ligand do ablate. Volatile photoproducts were identified using mass spectroscopy when irradiated with either EUV light or electron beams. These photoproducts include carbon dioxide and fragments of some of the R and R’ groups. A mechanism is proposed in which the styrene carboxylate ligand plays a pivotal role, by first polymerizing (thermally or as a result of low levels of flare) then decomposing to produce carboxylates or metal fragments that are soluble in aqueous base developer.

University at Albany, State University of New York (US)
Openalex Percentile: Top 29%
Advancements in Photolithography Techniques
0.73
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