Pattern Formation on Alloys by Cluster Ion Beam Irradiation

Surface nanopatterning induced by ion beam irradiation allows for the creation of patterns on large areas of a wide variety of materials. However, surface composition plays a crucial role in the process. In this study, we investigate the bombardment of a metallic alloy, specifically an Au-Cu system with different compositions, discussing differences in the formation of patterns compared to pure materials. Mixtures with compositions ranging from 35 to 65 at.% Cu exhibit a dampening effect on ripple height and depth. At intermediate angles of incidence, horizontal displacement is minimized and sputtering maximized; conversely, at grazing angles, sputtering is minimized and horizontal displacement becomes dependent on material mobility. It is, therefore, evident that sputtering determines the patterning for intermediate angles. However, an analysis of the redistribution factor as a function of the angle of incidence shows that the weight of the redistribution is much lower than that of sputtering in alloys of similar composition at grazing angles due to the amorphization process. This point is confirmed by the data on displaced atoms obtained from the relocation cross-sections.