Realistic 3D topography simulation for next-generation plasma processes

We present a realistic 3D process simulation that bridges the reactor scale to the nanoscale, with the aim of advancing the understanding of next-generation plasma processes. This approach is designed to capture the effects of the bulk plasma chemistries on the nanoscale process simulation. A brief overview is provided on the development of a bulk plasma and surface reaction database for both the conventional and novel plasma process gas chemistries. The approach demonstrates the ability to provide insights into realistic plasma chemistry addressing emerging challenges in next-generation plasma processes, including trimming processes, low temperature process, novel gases, and surface charging phenomena.