ASD from lithography replacement to lithography enhancement
This presentation will show that although the original idea of Area Selective Deposition (ASD) process was to replace lithography steps, there is a growing interest in using ASD to improve lithography and plasma etching performances.
Authors
- Rhonda Robert (ORCID: https://orcid.org/0000-0002-8123-9085)
- C. Vallée (ORCID: https://orcid.org/0000-0002-9324-2345)
- Nguyen Van Long (ORCID: https://orcid.org/0000-0002-5665-1019)
- Carl A. Ventrice (ORCID: https://orcid.org/0000-0002-6756-7939)
- Gregory H. Denbeaux
- Nicolas Pinos Maldonado
- Anthony Valenti
- shivan Antar
- Ciaran C. Mackenzie
Institutions
- University at Albany, State University of New York (US)
Publication Details
- Published
- 2025-04-22
- DOI
- https://doi.org/10.1117/12.3056724
- Primary Topic
- 3D IC and TSV technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00