Digital lithography
A new era of extending Moore’s Law now begins with how best to enable Advanced Packaging manufacturing. Unlike frontend lithography on CMP wafers with super flatness, chiplet manufacturing requires a lithography tool that meets CDU, overlay, and throughput requirements under challenging substrate conditions. For instance, die displacement during pick-and-place increases overlay errors if uncorrected, and substrate warpage induces lateral pattern distortion, further degrading overlay performance. A production-worthy lithography tool for advanced packaging must address these challenges with high throughput while assuring a chiplet manufacturing roadmap scaling. Applied Materials has developed revolutionary Digital Lithography Technologies (DLT) for both wafer-level and panel-level packaging. Its proprietary Digital Dynamic Connection (DDC) and Unit Alignment technologies correct for die displacement and warpage-induced pattern distortion. The maskless nature of DLT eliminates the reticle-stitching problem when printing large AI packages. Additionally, a high-performance platform can process four wafers simultaneously, quadrupling throughput. With a roadmap extending to 0.5µm and below, DLT is well-positioned to support Advanced Packaging now and into the sub-micron regime.
Authors
- Cheng‐Hsiu Tsai (ORCID: https://orcid.org/0000-0003-3617-366X)
- Thomas L. Laidig
- Jang Fung Chen
Institutions
- Applied Materials (United States) (US)
Publication Details
- Published
- 2025-04-22
- DOI
- https://doi.org/10.1117/12.3046576
- Citations
- 1
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.73