0.33 NA EUV systems for high-volume manufacturing

ASML NXE:3400 and NXE:3600D scanners are now commonly used for High Volume Manufacturing (HVM) of 7 nm to 3 nm logic devices as well as 10 nm class memory devices. In 2024 the ASML NXE:3800E scanner has been released and started shipping to customers to support the next HVM nodes. In this paper we will share the latest performance of these systems, including improvements in overlay, critical dimension (CD) control, stability, reliability, and high productivity Furthermore, we will describe the latest technology supporting the ASML roadmap for further improving cost of technology via increased productivity and platform commonality. Lastly we will show the ASML NXE sustainability roadmap driving progress to drastically reduce the energy consumed for each wafer exposed on NXE systems.