High-NA imaging performance, a year of learnings after first light on wafer

A year after the first photons made their way through the optical column of a high-NA system, we provide an in-depth experimental study of its key imaging features. This work highlights three main aspects of the novel 0.55NA optics and their relation to Imaging performance: the aberrations, the obscuration and the anamorphic design. This is done by in-resist experiments, which are compared to (sensor-based) lithographic simulations to provide understanding on the Imaging of the 0.55NA system.