Detection sensitivity of actinic patterned mask inspection systems for high-NA EUV lithography

Actinic patterned mask inspection (APMI) is essential for EUV photomask qualification. ACTIS is a high-resolution, high-throughput APMI tool that reliably detects all types of lithographic-impact defects. In this paper, the current status of new generation ACTIS A300 series will be discussed, including its detection sensitivity for pattern pitches of future technology nodes that are expected to be used in high-NA EUV lithography.

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Publication Details

Published
2025-04-22
DOI
https://doi.org/10.1117/12.3050110
Primary Topic
Advancements in Photolithography Techniques
Type
article
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article

Detection sensitivity of actinic patterned mask inspection systems for high-NA EUV lithography

Toshiyuki Todoroki, Hiroki Miyai, Moriji Mizoguchi, K.I. Gondaira et al.
Advancements in Photolithography Techniques
article

Detection sensitivity of actinic patterned mask inspection systems for high-NA EUV lithography

Toshiyuki Todoroki, Hiroki Miyai, Moriji Mizoguchi, K.I. Gondaira, Itaru Matsugu
article en

Abstract

Actinic patterned mask inspection (APMI) is essential for EUV photomask qualification. ACTIS is a high-resolution, high-throughput APMI tool that reliably detects all types of lithographic-impact defects. In this paper, the current status of new generation ACTIS A300 series will be discussed, including its detection sensitivity for pattern pitches of future technology nodes that are expected to be used in high-NA EUV lithography.

Openalex Percentile: Top 94%
Advancements in Photolithography Techniques
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Detection sensitivity of actinic patterned mask inspection systems for high-NA EUV lithography — Toshiyuki Todoroki, Hiroki Miyai, et al. · (2025) | TGRS Research Map | TGRS