Artificial Neural Network-Based Screening Method for Short-Circuit Withstand Time in Packaged SiC MOSFETs to Enhance Device Consistency

Developing an effective methodology to enhance the uniformity of short-circuit withstand time (SCWT) in silicon carbide (SiC) MOSFETs is crucial for ensuring device reliability and consistency in power electronic systems. This letter presents a detailed analysis of SCWT variations caused by inevitable process-induced deviations and introduces a new screening approach based on artificial neural network (ANN) technology. A two-hidden-layer ANN model is constructed using characteristic parameters extracted from SiC MOSFETs. The trained model accurately predicts the SCWT of TCAD-simulated SiC MOSFETs, achieving a maximum error of less than 15% and an average error of only 2%. This proposed method effectively identifies and removes devices with shorter SCWT without compromising the performance of reliable devices, thereby enhancing post-fabrication consistency for packaged devices.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-04-21
DOI
https://doi.org/10.1109/led.2025.3562694
Citations
3
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
2.19
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Artificial Neural Network-Based Screening Method for Short-Circuit Withstand Time in Packaged SiC MOSFETs to Enhance Device Consistency

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3 citations
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article

Artificial Neural Network-Based Screening Method for Short-Circuit Withstand Time in Packaged SiC MOSFETs to Enhance Device Consistency

Atsushi Shimbori, Michael Jin, Monikuntala Bhattacharya, Hengyu Yu, Anant Agarwal, Shiva Houshmand, Limeng Shi, Marvin H. White
article en
3 citations

Abstract

Developing an effective methodology to enhance the uniformity of short-circuit withstand time (SCWT) in silicon carbide (SiC) MOSFETs is crucial for ensuring device reliability and consistency in power electronic systems. This letter presents a detailed analysis of SCWT variations caused by inevitable process-induced deviations and introduces a new screening approach based on artificial neural network (ANN) technology. A two-hidden-layer ANN model is constructed using characteristic parameters extracted from SiC MOSFETs. The trained model accurately predicts the SCWT of TCAD-simulated SiC MOSFETs, achieving a maximum error of less than 15% and an average error of only 2%. This proposed method effectively identifies and removes devices with shorter SCWT without compromising the performance of reliable devices, thereby enhancing post-fabrication consistency for packaged devices.

IEEE Electron Device LettersVol. 46(7)
Ford Motor Company (United States) (US), The Ohio State University (US)
Openalex Percentile: Top 13%
Silicon Carbide Semiconductor Technologies
2.19
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