Accelerating Photo-Response of InZnO TFTs via Field Modulation Under Dual-Gate Bias
Oxide-based photo thin-film transistors (TFTs) usually exhibit high photo-responsivity but suffer from slow dynamic photo-response. In this work, the accelerated photo-response in InZnO TFTs under dual-gate bias is demonstrated by biasing the bottom-gate close to turn-on voltage and using a thick bottom-gate insulator. The acceleration is attributed to the reduction of the vertical electrical field across the channel layer, which facilitates the recombination of ionized oxygen vacancies (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">VO<sup>²+</sup></i>) with photo-generated electrons. As a result, a record-fast photocurrent rise time of about 10 μs is achieved under 409 nm illumination at an intensity of 2 mW/cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>.
Authors
- Shengdong Zhang (ORCID: https://orcid.org/0000-0002-1815-8661)
- Tengyan Huang (ORCID: https://orcid.org/0000-0001-8217-0852)
- Yuhang Zhang (ORCID: https://orcid.org/0000-0003-1987-0703)
- Yuhan Zhang (ORCID: https://orcid.org/0000-0003-1674-1658)
- Jiye Li (ORCID: https://orcid.org/0000-0001-6648-0615)
- Hang Zhou (ORCID: https://orcid.org/0009-0008-9469-9292)
- Lei Lü (ORCID: https://orcid.org/0000-0001-5275-2181)
Institutions
- Peking University (CN)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2025-04-21
- DOI
- https://doi.org/10.1109/led.2025.3562554
- Citations
- 2
- Primary Topic
- Thin-Film Transistor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 1.46
Funders
- National Natural Science Foundation of China
- National Science and Technology Major Project