Pressure-induced metallization and Lifshitz transition in quasi-one-dimensional TiSe <sub>3</sub> single crystal

Abstract The transition metal trichalcogenides (TMTs) with quasi-one-dimensional (quasi-1D) layered crystal structure represent a unique platform to explore intriguing physical properties. Herein, we report the successful growth of a new TMT TiSe 3 single crystal by using a high-pressure and high-temperature technique. The crystal structure of TiSe 3 was determined by measuring the single-crystal x-ray diffraction and selected area electron diffraction. The 1D chain-like structure along the b -axis is formed by the TiSe 6 prisms which share their tops and bottoms with each other. TiSe 3 is a narrow band gap semiconductor with electron-type carriers under ambient conditions identified by the electrical and Hall effect measurements. It exhibits a pressure-induced semiconductor-to-metal transition around 4 GPa. As the pressure further increases to ∼ 6 GPa, a pressure-induced Lifshitz transition occurs, as indicated by the electrical transport measurements, high-pressure crystal structure characterizations, and electronic band structure calculations.

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Publication Details

Journal
Chinese Physics B
Published
2025-04-21
DOI
https://doi.org/10.1088/1674-1056/adce9d
Citations
2
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
1.04
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article

Pressure-induced metallization and Lifshitz transition in quasi-one-dimensional TiSe 3 single crystal

Yunguan Ye, Yanfeng Guo, Zhiwei Shen, Zhenhai Yu et al.
2 citations
Chinese Physics B
2D Materials and Applications
1.04
article

Pressure-induced metallization and Lifshitz transition in quasi-one-dimensional TiSe 3 single crystal

Yunguan Ye, Yanfeng Guo, Zhiwei Shen, Zhenhai Yu, C. S. Chu, Pengtao Yang, Liu-Cheng Chen, Jun Li, Yiming Wang, Ziyi Liu, Xia Wang, Mingtao Li, Chenglin Li, Shaojie Wang, Jian Yuan, Wenge Yang, Lin Wang
article en
2 citations

Abstract

Abstract The transition metal trichalcogenides (TMTs) with quasi-one-dimensional (quasi-1D) layered crystal structure represent a unique platform to explore intriguing physical properties. Herein, we report the successful growth of a new TMT TiSe 3 single crystal by using a high-pressure and high-temperature technique. The crystal structure of TiSe 3 was determined by measuring the single-crystal x-ray diffraction and selected area electron diffraction. The 1D chain-like structure along the b -axis is formed by the TiSe 6 prisms which share their tops and bottoms with each other. TiSe 3 is a narrow band gap semiconductor with electron-type carriers under ambient conditions identified by the electrical and Hall effect measurements. It exhibits a pressure-induced semiconductor-to-metal transition around 4 GPa. As the pressure further increases to ∼ 6 GPa, a pressure-induced Lifshitz transition occurs, as indicated by the electrical transport measurements, high-pressure crystal structure characterizations, and electronic band structure calculations.

Chinese Physics BVol. 34(8)
Chinese Academy of Sciences (CN), ShanghaiTech University (CN), Yanshan University (CN), Center for High Pressure Science and Technology Advanced Research (CN), Institute of Physics (CN), National Laboratory for Superconductivity (CN)
Openalex Percentile: Top 26%
2D Materials and Applications
1.04
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