USE OF HIGH-VOLTAGE PULSE SUBSTRATE BIAS POTENTIAL IN THE DEPOSITION OF VACUUM-ARC COATINGS (METHOD PIIID)

The physical foundations of the use of pulsed substrate bias potential (PIIID method) in the processes of coatings deposition from filtered vacuum-arc plasma are considered. The possibilities of controlling the coatings properties when using the PIIID method are discussed. Information is provided on the characteristics of the materials of coatings depending on the parameters of the pulsed potential. The requirements for equipment used in PIIID deposition of vacuum-arc coatings are discussed. A brief review is presented of experimental and theoretical works performed at the NSC KIPT on deposition hard carbon and nitride coatings by PIIID method from filtered vacuum-arc plasma.