Demystifying furfural electrooxidation descriptors via laser-patterned dianionic sulfur-selenide fused metal-chalcogenides
• Pulsed laser synthesizes Ni 3 S x Se 4-x without reducing agent for furfural oxidation . • SeCl 4 dissolves into Se 2− and serves as an anionic source via pulsed laser ablation . • Se and S anions improve the catalytic activity/stability of Ni for furfural oxidation. • Produces 13.7 mM furoic acid with 73.1% selectivity and 98.8% Faradaic efficiency. • NiOOH species form under oxidation, aiding water and furfural oxidation reactions. Utilizing electrocatalysis on biomass-derived furfural molecules affords a method for producing valuable feedstocks, offering a robust substitute to the traditionally sluggish oxygen evolution reaction (OER). This study introduces a pulsed laser ablation in liquids (PLAL) approach for synthesizing dianionic sulfur-selenide fused nickel-chalcogenides (Ni 3 S x Se 4−x ), facilitating electrochemical OER and furfural oxidation reaction (FOR) in alkaline solution. SeCl 4 dissolves into Se 2− and serves as an anionic source via PLAL without requiring a reducing agent. Incorporating Se and S anions into Ni 3 S x Se 4−x modulates the electronic structure of Ni, thereby enhancing its intrinsic catalytic action and stability for OER. Furthermore, FOR catalyzed over Ni 3 S x Se 4−x produces approximately 13.7 mM furoic acid with a selectivity of ∼73.14%, carbon balance of ∼89.94%, and a notable Faradaic efficiency of approximately 98.82% over 2 h at 1.58 V vs . RHE. In situ electrochemical–Raman probe identified the formation of NiOOH reactive species through surface restructuring under oxidation potential, acting as a terminal for both water and furfural molecules. This research underscores the effectiveness of laser-patterned nickel sulfo-selenide in modulating oxidation activity, significantly contributing to the selective valorization of biomass. Our DFT calculations further validate that nickel sulfo-selenide demonstrates exceptional capabilities in adsorbing furfural and facilitating its efficient conversion to furoic acid through electrooxidation reactions.
Authors
- Ahreum Min (ORCID: https://orcid.org/0000-0003-3078-4312)
- Cheol Joo Moon (ORCID: https://orcid.org/0000-0002-6667-2673)
- M.L. Aruna Kumari
- Ratchadaree Intayot (ORCID: https://orcid.org/0000-0002-2158-7854)
- Myong Yong Choi (ORCID: https://orcid.org/0000-0001-5729-5418)
- Jayaraman Theerthagiri (ORCID: https://orcid.org/0000-0002-5746-5541)
- Yewon Oh
- Siriporn Jungsuttiwong
Institutions
- Gyeongsang National University (KR)
- Oxford Dental College and Hospital (IN)
- Ubon Ratchathani University (TH)
Publication Details
- Journal
- Chemical Engineering Journal
- Published
- 2025-04-19
- DOI
- https://doi.org/10.1016/j.cej.2025.162873
- Citations
- 2
- Primary Topic
- Chalcogenide Semiconductor Thin Films
- Type
- article
- Field-Weighted Citation Impact
- 1.46