Systematic Investigation on the Performance and Reliability of 4H-SiC MOSFETs With Nonkiller Epitaxial Morphological Defects

Epitaxial morphological defects in silicon carbide (SiC) MOSFETs can induce device failures. While chip probing (CP) methods can identify and distinguish many failed devices, some nonkiller epitaxial morphological defects often pass the initial screening, leading to early failures in practical applications. This study investigates the impact of SiC morphological defects on device performance, short-circuit (SC) reliability, and long-term reliability. Through a combination of experimental analysis and TCAD simulations, strong evidence is provided for the diverse effects of morphological defects on device performance. The results reveal that the Carrot-Defect significantly degrades the quality of the gate oxide, leading to premature failures in long-term reliability and SC tests. In contrast, the Triangle-Defect primarily affects the blocking capability of the device, while the SC performance of devices with such morphological defects that pass screening does not significantly deteriorate.

Authors

Institutions

Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2025-04-17
DOI
https://doi.org/10.1109/ted.2025.3556053
Citations
1
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
0.73

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Systematic Investigation on the Performance and Reliability of 4H-SiC MOSFETs With Nonkiller Epitaxial Morphological Defects

Yibo Zhang, Yanjing He, Aijun Zhang, Fengyu Du et al.
1 citations
IEEE Transactions on Electron Devices
Silicon Carbide Semiconductor Technologies
0.73
article

Systematic Investigation on the Performance and Reliability of 4H-SiC MOSFETs With Nonkiller Epitaxial Morphological Defects

Yibo Zhang, Yanjing He, Aijun Zhang, Fengyu Du, Yu Zhou, Xiao-Yan Tang, Haohang Yang, Chenyu Wang, Yuming Zhang, Zhiwen Zhang, Qingwen Song, Keyu Liu, Chao Han, Jingkai Guo
article en
1 citations

Abstract

Epitaxial morphological defects in silicon carbide (SiC) MOSFETs can induce device failures. While chip probing (CP) methods can identify and distinguish many failed devices, some nonkiller epitaxial morphological defects often pass the initial screening, leading to early failures in practical applications. This study investigates the impact of SiC morphological defects on device performance, short-circuit (SC) reliability, and long-term reliability. Through a combination of experimental analysis and TCAD simulations, strong evidence is provided for the diverse effects of morphological defects on device performance. The results reveal that the Carrot-Defect significantly degrades the quality of the gate oxide, leading to premature failures in long-term reliability and SC tests. In contrast, the Triangle-Defect primarily affects the blocking capability of the device, while the SC performance of devices with such morphological defects that pass screening does not significantly deteriorate.

IEEE Transactions on Electron DevicesVol. 72(5)
Xidian University (CN)
China Postdoctoral Science Foundation, National Key Research and Development Program of China
Zero hunger
Openalex Percentile: Top 29%
Silicon Carbide Semiconductor Technologies
0.73
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.