Design and preparation of 222nm deep ultraviolet thin films

This paper proposes a design scheme for a deep ultraviolet anti-reflective film, with a substrate material of JGS1, and high and low refractive index materials of Al 2 O 3 and AlF 3 , respectively. The Essential Macleod optical thin film design software was used to simulate the 222nm deep ultraviolet anti-reflective film. The simulation results show a transmission rate of 99.99%at 222nm. However, due to the presence of scattering and absorption, the actual experimental transmission rate is 99.2%. Although the actual transmission rate is 0.79%lower than the theoretical value, it still meets the application requirements.