Epitaxial aluminum layer on antimonide heterostructures for exploring Josephson junction effects

• Epitaxial growth of aluminum thin films on antimonide heterostructures . • MBE growth of high mobility InAs quantum wells . • high-quality epi-Al/antimonide heterostructures for quantum information science and microelectronics applications. In this article, we present results of our recent work of epitaxially-grown aluminum (epi-Al) on antimonide heterostructures, where the epi-Al thin film is grown at either room temperature or below zero °C. A sharp superconducting transition at T ∼ 1.3 K is observed in these epi-Al films. We further show that supercurrent states are realized in Josephson junctions fabricated in the epi-Al/antimonide heterostructures with mobility μ ∼ 1.0 × 10 6 cm 2 /Vs. These results clearly demonstrate we have achieved growing high-quality epi-Al/antimonide heterostructures, a promising platform for the exploration of Josephson junction effects for quantum information science and microelectronics applications.

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Publication Details

Journal
Materials Science and Engineering B
Published
2025-04-17
DOI
https://doi.org/10.1016/j.mseb.2025.118285
Citations
1
Primary Topic
Topological Materials and Phenomena
Type
article
Field-Weighted Citation Impact
1.25

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article

Epitaxial aluminum layer on antimonide heterostructures for exploring Josephson junction effects

John F. Klem, William M. Martinez, Samuel D. Hawkins, Denis Mamaluy et al.
1 citations
Materials Science and Engineering B
Topological Materials and Phenomena
1.25
article

Epitaxial aluminum layer on antimonide heterostructures for exploring Josephson junction effects

John F. Klem, William M. Martinez, Samuel D. Hawkins, Denis Mamaluy, Aaron J. Muhowski, Keshab Sapkota, Enrico Rossi, Ping Lü, Robert Reyna, Lee Smith, Juan Mendez Granado, Wei Pan, Zhi Jiang, Doyle A. Temple, Z. Enderson, Courtney L.H. Sovinec
article en
1 citations

Abstract

• Epitaxial growth of aluminum thin films on antimonide heterostructures . • MBE growth of high mobility InAs quantum wells . • high-quality epi-Al/antimonide heterostructures for quantum information science and microelectronics applications. In this article, we present results of our recent work of epitaxially-grown aluminum (epi-Al) on antimonide heterostructures, where the epi-Al thin film is grown at either room temperature or below zero °C. A sharp superconducting transition at T ∼ 1.3 K is observed in these epi-Al films. We further show that supercurrent states are realized in Josephson junctions fabricated in the epi-Al/antimonide heterostructures with mobility μ ∼ 1.0 × 10 6 cm 2 /Vs. These results clearly demonstrate we have achieved growing high-quality epi-Al/antimonide heterostructures, a promising platform for the exploration of Josephson junction effects for quantum information science and microelectronics applications.

Materials Science and Engineering BVol. 318
Norfolk State University (US), Oak Ridge Associated Universities (US), Oak Ridge National Laboratory (US), Georgia Institute of Technology (US), William & Mary (US), Sandia National Laboratories California (US), Williams (United States) (US), Sandia National Laboratories (US)
National Science Foundation, U.S. Department of Energy, National Nuclear Security Administration, Basic Energy Sciences, Laboratory Directed Research and Development, Sandia National Laboratories
Openalex Percentile: Top 22%
Topological Materials and Phenomena
1.25
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