X-Ray Effects on Alpha-Induced Soft Error Rate in 3-D NAND Replacement Gate Flash Memory Cells
In real-life operation, electronic devices are exposed at the same time to different sources of ionizing radiation. In this paper, we evaluate the impact of x-rays effects on the alpha-induced soft error rate in 3D NAND Flash memories with replacement gate architecture, one of the most widely used non-volatile technology. Threshold voltage shifts and bit error rates due to alpha particle exposure in devices previously exposed or not to x-rays are studied, focusing on the response of memory cells. Experimental results show that the alpha soft error rate is not significantly affected by previous x-ray irradiation, at least for small doses, well above those commonly used for printed circuit board inspections.
Authors
- A. Paccagnella (ORCID: https://orcid.org/0000-0002-6850-4286)
- Simone Gerardin (ORCID: https://orcid.org/0000-0002-1260-0586)
- Silvia Beltrami
- Marta Bagatin (ORCID: https://orcid.org/0000-0003-2779-3461)
Institutions
- Micron (Italy) (IT)
Publication Details
- Journal
- IEEE Transactions on Nuclear Science
- Published
- 2025-04-17
- DOI
- https://doi.org/10.1109/tns.2025.3561936
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00