NBTI measurement techniques assessment
Negative Bias Temperature Instability (NBTI) is a critical reliability concern in PMOS transistors, causing threshold voltage (V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf>) drift and performance degradation over time. This study evaluates and compares NBTI measurement methods highlighting their strengths and limitations.An impedance meter (LCR-meter) based method is pro-posed, which preserves stress conditions and eliminates recovery artifacts. Experimental results demonstrate that this strategy provides more accurate and high-resolution data, making it a cost-effective and reliable alternative to assess V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf> drift in CMOS technologies.
Authors
- M. Garcia–Inza
- S. Carbonetto
- L. Sambuco Salomone (ORCID: https://orcid.org/0000-0002-4047-7458)
- Félix Palumbo (ORCID: https://orcid.org/0000-0002-7749-5035)
- Leandro Schiavoni
- Lucas Liaño
- Nicolas Gabriel Cotti
Institutions
- National Technological University (AR)
- Consejo Nacional de Investigaciones Científicas y Técnicas (AR)
- Universidad de Buenos Aires (AR)
Publication Details
- Published
- 2025-03-13
- DOI
- https://doi.org/10.1109/cae64243.2025.10961993
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00