Effect of silicon doping in nanostructured hematite thin films for photoelectrochemical hydrogen generation

In this work, the researcher concentrated on the synthesis and analysis of the properties of Si-doped nanostructured hematite ([Formula: see text]-Fe 2 O[Formula: see text] thin films, aiming to use them as photoelectrodes in photoelectrochemical (PEC) cells for the production of hydrogen. Spray pyrolysis, deposition method is used for thin-film synthesis to achieve uniform, nanostructured layers with controllable doping levels. The confirmation of the hematite phase by XRD ensures that the desired [Formula: see text]-Fe 2 O 3 structure was achieved in both doped and undoped films. Scanning Electron Microscopy (SEM) analysis, revealing surface morphology and nanoscale structures, provided insights into how Si-doping affected factors like grain size, porosity, etc. The significant visible light absorption observed ([Formula: see text]2.1[Formula: see text]eV) aligns well with the band gap of hematite, which is promising for PEC applications. Furthermore, the marked improvement in photocurrent — specifically, a threefold increase ([Formula: see text]680[Formula: see text] [Formula: see text]A/cm 2 at 0.7[Formula: see text]V/SCE) at a 0.002 M Si-doping concentration highlights the effectiveness of Si doping by introducing favorable electronic changes, potentially increasing the conductivity of the hematite. The substitution of Fe[Formula: see text] ions by Si[Formula: see text] in the [Formula: see text]-Fe 2 O 3 lattice likely contributes to enhanced charge separation and reduced recombination rates that are the critical factors in sustaining higher photocurrents.

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Publication Details

Journal
International Journal of Modern Physics B
Published
2025-04-14
DOI
https://doi.org/10.1142/s0217979225501711
Citations
1
Primary Topic
Iron oxide chemistry and applications
Type
article
Field-Weighted Citation Impact
0.36
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article

Effect of silicon doping in nanostructured hematite thin films for photoelectrochemical hydrogen generation

Vibha R. Satsangi, Khushbu Yadav, Santosh Bihari Sharma, S. C. Upadhyaya et al.
1 citations
International Journal of Modern Physics B
Iron oxide chemistry and applications
0.36
article

Effect of silicon doping in nanostructured hematite thin films for photoelectrochemical hydrogen generation

Vibha R. Satsangi, Khushbu Yadav, Santosh Bihari Sharma, S. C. Upadhyaya, Praveen Kumar
article en
1 citations

Abstract

In this work, the researcher concentrated on the synthesis and analysis of the properties of Si-doped nanostructured hematite ([Formula: see text]-Fe 2 O[Formula: see text] thin films, aiming to use them as photoelectrodes in photoelectrochemical (PEC) cells for the production of hydrogen. Spray pyrolysis, deposition method is used for thin-film synthesis to achieve uniform, nanostructured layers with controllable doping levels. The confirmation of the hematite phase by XRD ensures that the desired [Formula: see text]-Fe 2 O 3 structure was achieved in both doped and undoped films. Scanning Electron Microscopy (SEM) analysis, revealing surface morphology and nanoscale structures, provided insights into how Si-doping affected factors like grain size, porosity, etc. The significant visible light absorption observed ([Formula: see text]2.1[Formula: see text]eV) aligns well with the band gap of hematite, which is promising for PEC applications. Furthermore, the marked improvement in photocurrent — specifically, a threefold increase ([Formula: see text]680[Formula: see text] [Formula: see text]A/cm 2 at 0.7[Formula: see text]V/SCE) at a 0.002 M Si-doping concentration highlights the effectiveness of Si doping by introducing favorable electronic changes, potentially increasing the conductivity of the hematite. The substitution of Fe[Formula: see text] ions by Si[Formula: see text] in the [Formula: see text]-Fe 2 O 3 lattice likely contributes to enhanced charge separation and reduced recombination rates that are the critical factors in sustaining higher photocurrents.

International Journal of Modern Physics BVol. 39(19)
Dayalbagh Educational Institute (IN), Ambedkar University Delhi (IN)
Openalex Percentile: Top 45%
Iron oxide chemistry and applications
0.36
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