Principles for fabricating moisture barrier films via stacked Janus graphene layers

The excellent impermeability makes graphene film an ideal candidate for thin film encapsulation technology. However, current chemical vapor deposition (CVD) graphene-based barrier films can not provide sufficient moisture barrier performance, suggesting a lack of understanding in mechanism that dominates water diffusion in/through graphene stacks. Herein, we fabricate large-area graphene barrier films with a record-low water vapor transmission rate (WVTR) of 5 × 10<sup>-5 </sup>g/(m<sup>2</sup>·day), two orders of magnitude lower than previous works, in which two stacked Janus graphene films are intercalated by toluidine blue O (TBO) sub-monolayer: one side of graphene is decorated with fluorine- and oxygen-containing groups to allow crack-free transfer, while the other side is functionalized with hydroxyl groups to trap water. The intercalated TBO further blocks water transport due to a strong water-TBO interaction. Our work opens a route for surface/interface engineering of CVD graphene and promises its exciting future in the applications for advanced packaging.

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Publication Details

Journal
Nature Communications
Published
2025-04-13
DOI
https://doi.org/10.1038/s41467-025-58799-y
Citations
1
Primary Topic
Graphene research and applications
Type
article
Field-Weighted Citation Impact
0.52

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article

Principles for fabricating moisture barrier films via stacked Janus graphene layers

Li Lin, Zhaoning Hu, Zelong Li, Haotian Wu et al.
1 citations
Nature Communications
Graphene research and applications
0.52
article

Principles for fabricating moisture barrier films via stacked Janus graphene layers

Li Lin, Zhaoning Hu, Zelong Li, Haotian Wu, Saiyu Bu, Yixuan Zhao, Li Yin, Yang Su, Liang Fan, Fangfang Li, Xiaokai Hu, Qin Xie, Chaofan Zhou, Bingbing Guo, Zhongfan Liu, Hongjie Gao
article en
1 citations

Abstract

The excellent impermeability makes graphene film an ideal candidate for thin film encapsulation technology. However, current chemical vapor deposition (CVD) graphene-based barrier films can not provide sufficient moisture barrier performance, suggesting a lack of understanding in mechanism that dominates water diffusion in/through graphene stacks. Herein, we fabricate large-area graphene barrier films with a record-low water vapor transmission rate (WVTR) of 5 × 10<sup>-5 </sup>g/(m<sup>2</sup>·day), two orders of magnitude lower than previous works, in which two stacked Janus graphene films are intercalated by toluidine blue O (TBO) sub-monolayer: one side of graphene is decorated with fluorine- and oxygen-containing groups to allow crack-free transfer, while the other side is functionalized with hydroxyl groups to trap water. The intercalated TBO further blocks water transport due to a strong water-TBO interaction. Our work opens a route for surface/interface engineering of CVD graphene and promises its exciting future in the applications for advanced packaging.

Nature CommunicationsVol. 16(1)
Peking University (CN), Beijing Graphene Institute (CN), Tsinghua–Berkeley Shenzhen Institute (CN), Beijing National Laboratory for Molecular Sciences (CN), Guilin University of Electronic Technology (CN), Tsinghua University (CN)
National Natural Science Foundation of China, Peking University, National Key Research and Development Program of China
Openalex Percentile: Top 40%
Graphene research and applications
0.52
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