Optical characterization of X-ray polymer refractive lenses using a microfocus X-ray grating interferometer
Two-photon polymerization lithography is a technique that provides hundreds of nanometer resolution and full geometric freedom.Several X-ray polymer refractive lenses created by this technique were characterized using differential phase contrast imaging (DPCI) with a microfocus X-ray grating interferometer.The beam deflection angle and wavefront phase shift of the X-ray beam through the lens were obtained.Comparative tests using synchrotron radiation sources showed that the system could measure the surface shape of X-ray refractive lenses with an accuracy of 0.4 m.This study is important for improving the fabrication process and focusing performance of X-ray refractive lenses.
Authors
- Lei Yang (ORCID: https://orcid.org/0000-0002-1530-618X)
- Shuai Zhao (ORCID: https://orcid.org/0000-0001-9793-734X)
- Yifan Ding (ORCID: https://orcid.org/0009-0009-3060-4271)
- Keyi Wang (ORCID: https://orcid.org/0000-0002-6520-1562)
- Ziwen Huang (ORCID: https://orcid.org/0000-0003-4314-5771)
- Lian Xue (ORCID: https://orcid.org/0009-0009-5763-6193)
- Zhaofeng Kang (ORCID: https://orcid.org/0000-0002-8860-2959)
- D. Qin (ORCID: https://orcid.org/0009-0006-2649-4290)
Institutions
- University of Science and Technology of China (CN)
- Hefei University of Technology (CN)
- Chinese Academy of Sciences (CN)
- Shanghai Advanced Research Institute (CN)
- National Synchrotron Radiation Laboratory (CN)
Publication Details
- Journal
- Chinese Optics Letters
- Published
- 2025-01-01
- DOI
- https://doi.org/10.3788/col202523.043401
- Primary Topic
- Advanced X-ray Imaging Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- China Postdoctoral Science Foundation
- National Synchrotron Radiation Laboratory
- National Key Research and Development Program of China
- Fundamental Research Funds for the Central Universities