SeeDiff: Off-the-Shelf Seeded Mask Generation from Diffusion Models
Entrusted with the goal of pixel-level object classification, the semantic segmentation networks entails the laborious preparation of pixel-level annotation masks. To obtain pixel-level annotation masks for a given class without human efforts, recent few works have proposed to generate pairs of images and annotation masks by employing image and text relationships modeled by text-to-image generative models, especially Stable Diffusion. However, these works do not fully exploit the capability of text-guided Diffusion models and thus require a pre-trained segmentation network, careful text prompt tuning, or the training of a segmentation network to generate final annotation masks. In this work, we take a closer look at attention mechanisms of Stable Diffusion, from which we draw connections with classical seeded segmentation approaches. In particular, we show that cross-attention alone provides very coarse object localization, which however can provide initial seeds. Then, akin to region expansion in seeded segmentation, we utilize the semantic-correspondence-modeling capability of self-attention to iteratively spread the attention to the whole class from the seeds using multi-scale self-attention maps. We also observe that a simple-text-guided synthetic image often has a uniform background, which is easier to find correspondences, compared to complex-structured objects. Thus, we further refine a mask using a more accurate background mask. Our proposed method, dubbed SeeDiff, generates high-quality masks off-the-shelf from Stable Diffusion, without additional training procedure, prompt tuning, or a pre-trained segmentation network.
Authors
- Jun‐Hyoung Park (ORCID: https://orcid.org/0000-0002-5391-4135)
- Sung-Hoon Baik (ORCID: https://orcid.org/0000-0002-6728-1172)
- Kumju Jo
Institutions
- Hanyang University (KR)
Publication Details
- Journal
- Proceedings of the AAAI Conference on Artificial Intelligence
- Published
- 2025-04-11
- DOI
- https://doi.org/10.1609/aaai.v39i6.32686
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Hanyang University
- Ministry of Science and ICT, South Korea
- Institute for Information and Communications Technology Promotion