Formation and electrical conductance of TiO₂ coatings on Cu substrates

Abstract In this work, the possibility of formation of TiO 2 coatings on Cu substrates was investigated using a pure Ti interlayer. The structure of the formed specimens was studied using X-ray diffraction (XRD), and their electrical conductance was determined using electrical impedance spectroscopy (EIS) measurements. During the experiments, the deposition time for the TiO 2 films was varied. The results indicate that the Ti interlayer did not affect the output conductance results for the TiO 2 samples. The last exhibited very low conductance similar to that of semi-conductive materials. In the case of the deposition of the TiO 2 coating for the shorter time the XRD method was insufficient to determine the presence of TiO 2 atop the its’ surface due to the low thickness of this layer. However, the presence of metal-oxide layers on the surface of that sample was successfully established by means of impedance measurements and electrical conductance calculations.