Effect of Ce/(Hf + Ce) ratio on ferroelectric and piezoelectric properties and effect of film thickness on ferroelectricity for thick CeO<sub>2</sub>–HfO<sub>2</sub> films deposited by sputtering method without substrate heati

The dependence of ferroelectric properties on composition and film thickness was investigated for CeO 2 -HfO 2 films with various ratios x=Ce/(Hf+Ce), deposited on polyethylene terephthalate coated with an amorphous indium tin oxide layer (amorphous ITO/PET) substrates without substrate heating.Additionally, the dependence of composition on piezoelectric properties was examined.X-ray diffraction (XRD) analysis showed that the films consisted of atetragonal phase (T.) and/or orthorhombic (O.) phases with (111) and {100} out-of-plane orientations for the films with thicknesses ranging from 440 to 910 nm at x=0.23.In addition, the remnant polarization (P r ) increased from 6.0 to 11.7 C/cm 2 with the increase in the film thickness.To investigate the composition dependence, CeO 2 -HfO 2 films with a thickness of 800-1000 nm and x values of 0.17, 0.18, 0.23, and 0.28 were prepared.XRD showed (111) and {100} orientations in all films.Clear P-E hysteresis loops and switching currents were observed for x=0.18 and 0.23, with P r exceeding 10.0 C/cm 2 , even in films deposited on amorphous ITO/PET without substrate heating.Moreover, these films exhibited piezoelectric properties consistent with P-E loops, showing their potential for flexible piezoelectric applications.

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Journal
Journal of the Ceramic Society of Japan
Published
2025-04-09
DOI
https://doi.org/10.2109/jcersj2.25009
Primary Topic
Ferroelectric and Negative Capacitance Devices
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article
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article

Effect of Ce/(Hf + Ce) ratio on ferroelectric and piezoelectric properties and effect of film thickness on ferroelectricity for thick CeO2–HfO2 films deposited by sputtering method without substrate heati

Yu-Ta Chen, Hiroshi Funakubo, Wakiko Yamaoka, K. Okamoto et al.
4 links
Journal of the Ceramic Society of Japan
Ferroelectric and Negative Capacitance Devices
article

Effect of Ce/(Hf + Ce) ratio on ferroelectric and piezoelectric properties and effect of film thickness on ferroelectricity for thick CeO2–HfO2 films deposited by sputtering method without substrate heati

Yu-Ta Chen, Hiroshi Funakubo, Wakiko Yamaoka, K. Okamoto, Yukari Inoue, Hiroyuki ONO, Nachi Chaya, Nana Sun, Yuxian Hu, Miki Nakahata, Kohei Shimonosono
article en

Abstract

The dependence of ferroelectric properties on composition and film thickness was investigated for CeO 2 -HfO 2 films with various ratios x=Ce/(Hf+Ce), deposited on polyethylene terephthalate coated with an amorphous indium tin oxide layer (amorphous ITO/PET) substrates without substrate heating.Additionally, the dependence of composition on piezoelectric properties was examined.X-ray diffraction (XRD) analysis showed that the films consisted of atetragonal phase (T.) and/or orthorhombic (O.) phases with (111) and {100} out-of-plane orientations for the films with thicknesses ranging from 440 to 910 nm at x=0.23.In addition, the remnant polarization (P r ) increased from 6.0 to 11.7 C/cm 2 with the increase in the film thickness.To investigate the composition dependence, CeO 2 -HfO 2 films with a thickness of 800-1000 nm and x values of 0.17, 0.18, 0.23, and 0.28 were prepared.XRD showed (111) and {100} orientations in all films.Clear P-E hysteresis loops and switching currents were observed for x=0.18 and 0.23, with P r exceeding 10.0 C/cm 2 , even in films deposited on amorphous ITO/PET without substrate heating.Moreover, these films exhibited piezoelectric properties consistent with P-E loops, showing their potential for flexible piezoelectric applications.

Journal of the Ceramic Society of JapanVol. 133(7)
Intel (United States) (US), TDK (Japan) (JP), Division of Materials Science and Engineering (AU), Institute of Science Tokyo (JP)
Openalex Percentile: Top 94%
Ferroelectric and Negative Capacitance Devices
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