Understanding surface morphology evolution in magnetron sputtered AlN templates: mitigating tensile stress and enhancing crystal quality
The surface morphology evolution mechanism depending on the thickness of sputtered AlN films is revealed, and smooth high-quality AlN films are successfully fabricated.
Authors
- Tong Wu (ORCID: https://orcid.org/0000-0001-8645-4254)
- Entao Zhang (ORCID: https://orcid.org/0000-0002-1545-0325)
- Shunpeng Lü (ORCID: https://orcid.org/0000-0002-6289-3663)
- Xiaojuan Sun (ORCID: https://orcid.org/0000-0001-6836-3893)
- Ke Jiang (ORCID: https://orcid.org/0000-0002-8372-1473)
- Jianwei Ben (ORCID: https://orcid.org/0000-0003-2585-3360)
- Li Jiang (ORCID: https://orcid.org/0009-0004-4649-9270)
- Dabing Li
- Zikai Nie (ORCID: https://orcid.org/0009-0009-6643-9044)
- Shanli Zhang
Institutions
- University of Science and Technology of China (CN)
- Chinese Academy of Sciences (CN)
- Dalian University of Technology (CN)
- Changchun Institute of Optics, Fine Mechanics and Physics (CN)
- University of Chinese Academy of Sciences (CN)
Publication Details
- Journal
- CrystEngComm
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5ce00027k
- Citations
- 1
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 1.26
Funders
- Natural Science Foundation of Jilin Province
- National Natural Science Foundation of China
- Youth Innovation Promotion Association of the Chinese Academy of Sciences
- National Key Research and Development Program of China