VUV Photolysis of silane with nitric oxide in solid neon

We report the results of vacuum-ultraviolet (VUV) photolysis of SiH4 and NO in solid neon at 3 K. Photolysis at 130 nm produced a complex range of products, including SiH2, Si2H6, and various silicon oxides. Additionally, with the support of quantum chemical calculations and D-isotopic substituted experiments, we tentatively identified a new species, H2SiN(H)O, as an intermediate in the reaction of SiH3 with NO. These findings provide new insights into the VUV photochemistry of SiH4 and NO in a solid matrix and offer valuable information for understanding silicon-based combustion chemistry and astrochemistry.

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Publication Details

Journal
Low Temperature Physics
Published
2025-04-01
DOI
https://doi.org/10.1063/10.0036116
Citations
1
Primary Topic
Mass Spectrometry Techniques and Applications
Type
article
Field-Weighted Citation Impact
0.76
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article

VUV Photolysis of silane with nitric oxide in solid neon

Yu‐Jong Wu, Chih‐Hao Chin, J. F. Ogilvie, Sheng‐Lung Chou
1 citations
Low Temperature Physics
Mass Spectrometry Techniques and Applications
0.76
article

VUV Photolysis of silane with nitric oxide in solid neon

Yu‐Jong Wu, Chih‐Hao Chin, J. F. Ogilvie, Sheng‐Lung Chou
article en
1 citations

Abstract

We report the results of vacuum-ultraviolet (VUV) photolysis of SiH4 and NO in solid neon at 3 K. Photolysis at 130 nm produced a complex range of products, including SiH2, Si2H6, and various silicon oxides. Additionally, with the support of quantum chemical calculations and D-isotopic substituted experiments, we tentatively identified a new species, H2SiN(H)O, as an intermediate in the reaction of SiH3 with NO. These findings provide new insights into the VUV photochemistry of SiH4 and NO in a solid matrix and offer valuable information for understanding silicon-based combustion chemistry and astrochemistry.

Low Temperature PhysicsVol. 51(4)
National Yang Ming Chiao Tung University (TW), Simon Fraser University (CA), National Synchrotron Radiation Research Center (TW)
Openalex Percentile: Top 33%
Mass Spectrometry Techniques and Applications
0.76
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