VUV Photolysis of silane with nitric oxide in solid neon
We report the results of vacuum-ultraviolet (VUV) photolysis of SiH4 and NO in solid neon at 3 K. Photolysis at 130 nm produced a complex range of products, including SiH2, Si2H6, and various silicon oxides. Additionally, with the support of quantum chemical calculations and D-isotopic substituted experiments, we tentatively identified a new species, H2SiN(H)O, as an intermediate in the reaction of SiH3 with NO. These findings provide new insights into the VUV photochemistry of SiH4 and NO in a solid matrix and offer valuable information for understanding silicon-based combustion chemistry and astrochemistry.
Authors
- Yu‐Jong Wu (ORCID: https://orcid.org/0000-0001-9261-0655)
- Chih‐Hao Chin (ORCID: https://orcid.org/0000-0003-2580-8236)
- J. F. Ogilvie (ORCID: https://orcid.org/0000-0001-7537-999X)
- Sheng‐Lung Chou (ORCID: https://orcid.org/0000-0002-6528-3721)
Institutions
- National Yang Ming Chiao Tung University (TW)
- Simon Fraser University (CA)
- National Synchrotron Radiation Research Center (TW)
Publication Details
- Journal
- Low Temperature Physics
- Published
- 2025-04-01
- DOI
- https://doi.org/10.1063/10.0036116
- Citations
- 1
- Primary Topic
- Mass Spectrometry Techniques and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.76