Implication of annealing on the structures/chemistry of Al/AlOx/Al Josephson junction

Authors

Jaeyel Lee (ORCID: https://orcid.org/0000-0001-8542-9612)
Anna Grassellino (ORCID: https://orcid.org/0000-0002-3985-8296)
Alexander Romanenko (ORCID: https://orcid.org/0000-0003-1378-0870)
Francesco Crisa (ORCID: https://orcid.org/0000-0003-3536-4528)
Akshay A. Murthy (ORCID: https://orcid.org/0000-0001-7677-6866)
Mustafa Bal (ORCID: https://orcid.org/0000-0003-0751-6774)
Adam Clairmont
Sabrina Garattoni

Institutions

Fermi National Accelerator Laboratory (US)

Publication Details

Published: 2025-04-04
DOI: https://doi.org/10.2172/2549314
Primary Topic: Surface and Thin Film Phenomena
Type: article

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article

Implication of annealing on the structures/chemistry of Al/AlOx/Al Josephson junction

Jaeyel Lee, Anna Grassellino, Alexander Romanenko, Francesco Crisa et al.

Apr 4, 2025

Surface and Thin Film Phenomena

article

Implication of annealing on the structures/chemistry of Al/AlOx/Al Josephson junction

Jaeyel Lee, Anna Grassellino, Alexander Romanenko, Francesco Crisa, Akshay A. Murthy, Mustafa Bal, Adam Clairmont, Sabrina Garattoni

April 4, 2025article en

Abstract

No abstract available for this paper.

Fermi National Accelerator Laboratory (US)

Surface and Thin Film Phenomena

DOI Open Access PDF OpenAlex

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