Wavefront Characterization of an Optical Parametric Oscillator as a Function of Wavelength

The wavefront aberrations (WAs) of a laser beam produced by an optical parametric oscillator (OPO) have been measured using a Hartmann–Shack sensor. The OPO tuning operation requires changes in the device that might affect the shape of the wavefront beam as the illumination wavelength is being modified. Different output wavelengths in the range 550–850 nm were systematically analyzed in terms of WAs. The WA laser beam was fairly stable with time (changes of about 1%), independently of the wavelength. Moreover, WAs were non-negligible and nearly constant between 600 and 800 nm, but they noticeably increased for 550 (~90%) and 850 nm (~50%), mainly due to a higher astigmatism influence. The contributions of other higher-order terms such as coma and spherical aberration also present particular spectral dependences. To our knowledge, this is the first report of a spectral OPO laser beam characterization in terms of optical aberrations. It addresses a gap in OPO laser characterization of WAs and offers actionable insights for multi-wavelength applications. These results might be useful in applications ranging from micromachining procedures to biomedical imaging, where an optimized focal spot is required to increase the efficiency of certain physical phenomena or to enhance the quality of the acquired images.